光罩检测

在微技术领域中，光罩检测（英语：mask inspection）是检查光罩制作正确性的操作技术^[1]。用于定位光罩缺陷的是高级自动化系统，如扫描电子显微镜等^[2]。“光罩检测”一词也可能非正式地指称真正写入光罩前的光罩资料检测（mask data inspection）^[3]。

参考文献

^ "VLSI technology: fundamentals and applications", by Yasuo Tarui, 1986, ISBN 3-540-12558-2, Chapter 4: "Mask Inspection Technology"
^ ZEISS Webpage offering automated mask repair tools
^ "Design for manufacturability and yield for nano-scale CMOS", by Charles Chiang, Jamil Kawa, 2007, ISBN 1-4020-5187-5, p. 237

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[1] "VLSI technology: fundamentals and applications", by Yasuo Tarui, 1986, ISBN 3-540-12558-2, Chapter 4: "Mask Inspection Technology"

[2] ZEISS Webpage offering automated mask repair tools

[3] "Design for manufacturability and yield for nano-scale CMOS", by Charles Chiang, Jamil Kawa, 2007, ISBN 1-4020-5187-5, p. 237

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